As to diffusion barriers RusTec can propose two variants:
• chemical deposition of Ni-based multilayers with thickness 7±2 microns,
• combined plating via sputtering of thick 150 microns layers of Al and chemical deposition of Ni-based alloys (so-called H-technology).
Introduction of Al layers significantly increases cycling reliability of modules and reduces degradation of modules working at high temperatures, see chapter «Diffusion Barriers».